Chemical vapor deposition

Method used to apply surface coatings

Chemical vapor deposition (CVD) is a thin film deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce electrically conductive layers in the range of a few 100 nm up to a few μm. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface, in order to produce the desired deposit.

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